Semiconductor memory device and method of fabricating the same

ABSTRACT

A method of fabricating a semiconductor memory device includes etching a substrate that forms a trench that crosses active regions of the substrate, forming a gate insulating layer on bottom and side surfaces of the trench, forming a first gate electrode on the gate insulating layer that fills a lower portion of the trench, oxidizing a top surface of the first gate electrode where a preliminary barrier layer is formed, nitrifying the preliminary barrier layer where a barrier layer is formed, and forming a second gate electrode on the barrier layer that fills an upper portion of the trench.

CROSS-REFERENCE TO RELATED APPLICATIONS

This U.S. non-provisional patent application is a continuation of U.S. application Ser. No. 16/783,899, filed on Feb. 6, 2020 in the U.S. Patent and Trademark Office, which is a continuation-in-part of U.S. application Ser. No. 16/458,292, filed on Jul. 1, 2019 in the U.S. Patent and Trademark Office, which is a continuation of U.S. application Ser. No. 16/050,848, now U.S. Pat. No. 10,373,959, filed on Jul. 31, 2018 in the U.S. Patent and Trademark Office, which claims priority under 35 U.S.C. § 119 from, and the benefit of, Korean Patent Application No. 10-2017-0119715, filed on Sep. 18, 2017 in the Korean Intellectual Property Office, the contents of which are herein incorporated by reference in their entirety.

BACKGROUND

Embodiments of the present disclosure are directed to a semiconductor memory device and a method of fabricating the same, and in particular, to a semiconductor memory device that includes buried gate lines and a method of fabricating the same.

Due to their small-sized, multifunctional, or low-cost characteristics, semiconductor devices are important elements in the electronic industry. Semiconductor devices can be classified into semiconductor memory devices for storing data, semiconductor logic devices for processing data, and hybrid semiconductor devices that include both memory and logic elements.

Due to increasing demand for high speed low-power electronic devices, semiconductor devices require a fast operating speed or a low operating voltage. To satisfy this demand, a semiconductor device needs a high integration density, that is, more elements per area. However, an increase in the integration density can lead to a decrease in the reliability of the semiconductor device.

In a dual work function metal gate structure, a tungsten electrode is provided at a lower level, and an n-doped poly-silicon is provided at an upper level. In this structure, owing to a subsequent thermal treatment process, intermixing between the two materials can occur. To prevent this intermixing, a barrier layer having a low resistance property is used.

In a conventional technology, a SiO2-based material is used as the barrier layer. If such a SiO2-based barrier layer has a thickness of 10 Å or more, it can act as an insulating layer, which can lead to a deterioration of the electric characteristics of the semiconductor device. In some cases, the barrier layer is formed by directly depositing a TiN-based metal layer and removing a sidewall portion thereof. However, in these cases, it is challenging to control dispersion errors while depositing and removing the metal layer. Moreover, during the deposition process, metal contamination can occur in a sidewall portion of a gate oxide.

SUMMARY

Some embodiments of the inventive concept can provide a semiconductor memory device that is configured to reduce gate-induced-drain-leakage (GIDL) current, and a method of fabricating the same.

Some embodiments of the inventive concept can provide a semiconductor memory device having good reliability, and a method of fabricating the same.

According to exemplary embodiments of the inventive concept, a method of fabricating a semiconductor memory device include etching a substrate to form a trench that crosses active regions of the substrate, forming a gate insulating layer on bottom and side surfaces of the trench, forming a first gate electrode on the gate insulating layer that fills a lower region of the trench, oxidizing a top surface of the first gate electrode to form a preliminary barrier layer, nitrifying the preliminary barrier layer to form a barrier layer, and forming a second gate electrode on the barrier layer that fills an upper region of the trench.

According to exemplary embodiments of the inventive concept, a semiconductor memory device includes a semiconductor substrate that includes a trench, a gate insulating layer disposed in the trench that covers bottom and inner side surfaces of the trench, a first gate electrode disposed in a lower region of the trench, the first gate electrode including a first metal, a second gate electrode disposed in the trench and on the first gate electrode, and a barrier layer provided between the first and second gate electrodes, the barrier layer including an oxynitride of the first metal. A work-function of the second gate electrode is lower than a work-function of the first gate electrode.

According to exemplary embodiments of the inventive concept, a semiconductor memory device includes a substrate that includes active regions surrounded by a device isolation layer, the active regions extending in a first direction, gate lines buried in trenches formed in an upper portion of the substrate, where the gate lines cross the active regions in a second direction that crosses the first direction and divide the active regions into first and second doped regions, and a bit line disposed on the gate lines that extends in a third direction that crosses both of the first and second directions. Each of the gate lines includes a first gate electrode disposed in a lower region of the trench, where a top surface of the first gate electrode includes oxygen and nitrogen atoms, and a second gate electrode disposed on the first gate electrode.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a plan view of a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 2A and 2B are sectional views of a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 3 to 6 are sectional views that illustrate a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 7A to 7E are sectional views that illustrate a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 8A to 14A are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 8B to 14B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 10C to 12C are enlarged views of portions ‘A’ of FIGS. 10A to 12A, respectively.

FIG. 13C is a sectional view illustrating a process of forming a second gate electrode.

FIGS. 15A to 17A are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 15B to 17B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 18A and 19A are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 18B and 19B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 20A and 20B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

FIGS. 21A and 21B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

It should be noted that these drawings are not to scale and may not precisely reflect the precise structural or performance characteristics of any given embodiment. The use of similar or identical reference numbers in the various drawings may indicate the presence of a similar or identical element or feature.

DETAILED DESCRIPTION

Exemplary embodiments of the inventive concepts will now be described more fully with reference to the accompanying drawings, in which exemplary embodiments are shown.

FIG. 1 is a plan view of a semiconductor memory device according to some embodiments of the inventive concept. FIGS. 2A and 2B are sectional views taken along lines I-I′ and II-II′, respectively, of FIG. 1, that illustrate a semiconductor memory device according to some embodiments of the inventive concept. FIGS. 3 to 6 are sectional views, which are taken along line I-I′ of FIG. 1 and illustrate a semiconductor memory device according to some embodiments of the inventive concept.

In the present specification, a first direction D1, a second direction D2, and a third direction D3, which are defined on the same plane, will be used to scribe directional aspects of an element. The first direction D1 and the second direction D2 are perpendicular to each other, and the third direction D3 is not parallel to either of the first or second directions D1 and D2. FIG. 2A shows a cross section taken in the third direction D3, and FIG. 2B shows a cross section taken in the second direction D2.

According to some embodiments, referring to FIGS. 1, 2A, and 2B, a device isolation layer 110 is provided in a substrate 100 to define active regions ACT. The substrate 100 includes a semiconductor substrate. For example, the semiconductor substrate may be or include a silicon wafer, a germanium wafer, or a silicon-germanium wafer. When viewed in a plan view, each of the active regions ACT has a bar-like shape that extends in the third direction D3.

According to some embodiments, gate lines GL are provided in the substrate 100 to cross the active regions ACT, when viewed in a plan view. The gate lines GL can be used as word lines. The gate lines GL extend in the second direction D2 and are arranged in the first direction D1. The gate lines GL are buried in the substrate 100. For example, the gate lines GL can be provided in trenches 120 of the substrate 100. The trenches 120 extend to cross the active regions ACT.

According to some embodiments, each of the gate lines GL includes a first gate electrode 220, a barrier layer 230, and a second gate electrode 240. The first gate electrode 220 is provided in the trench 120. The first gate electrode 220 partially fills the trench 120. The first gate electrode 220 fills a lower region of the trench 120. The first gate electrode 220 is formed of or includes at least one metal such as tungsten (W), titanium (Ti), or tantalum (Ta).

According to some embodiments, the second gate electrode 240 is disposed on the first gate electrode 220 to fill a portion of the trench 120. When viewed in a plan view, the second gate electrode 240 overlaps the first gate electrode 220. For example, each of the first and second gate electrodes 220 and 240 extends in the second direction D2. The second gate electrode 240 covers a top surface of the first gate electrode 220. A top surface of the second gate electrode 240 is positioned at a level below that of a top surface of the substrate 100. A work-function of the second gate electrode 240 is lower than that of the first gate electrode 220. The second gate electrode 240 is formed of or includes polysilicon that is doped with n-type impurities. FIG. 2A illustrates an example in which the second gate electrode 240 has a flat top surface, but the inventive concept is not limited thereto. As shown in FIG. 3, the top surface 240 a of the second gate electrode 240 may have an inwardly recessed shape (i.e., a shape recessed toward the first gate electrode 220). For example, the top surface 240 a of the second gate electrode 240 may be formed to have a “V”-shaped section. In certain embodiments, the top surface 240 a of the second gate electrode 240 may be formed to have a “U”-shaped section.

According to some embodiments, the barrier layer 230 is disposed between the first and second gate electrodes 220 and 240. Owing to the barrier layer 230, the first and second gate electrodes 220 and 240 are not be in contact with each other or are spaced apart from each other. The barrier layer 230 can prevent silicon atoms in the second gate electrode 240 from diffusing into the first gate electrode 220, and thus can prevent a metal silicide layer from being formed in the first gate electrode 220. In addition, the barrier layer 230 can prevent n-type impurities, such as phosphorus (P), in the second gate electrode 240 from diffusing into the first gate electrode 220, and thus can prevent undesired materials, such as tungsten phosphide (WP₂), from forming in the first gate electrode 220. The barrier layer 230 is a thin film. For example, the barrier layer 230 has a thickness ranging from about 1 Å to about 50 Å. If the thickness of the barrier layer 230 is less than 1 Å, silicon atoms in the second gate electrode 240 can diffuse through the barrier layer 230 and into the first gate electrode 220. If the thickness of the barrier layer 230 is greater than 50 Å, an electrical resistance between the first and second gate electrodes 220 and 240 can increase, which can deteriorate electric characteristics of the gate lines GL. The barrier layer 230 is formed of or includes a metal oxynitride of a metallic element such as tungsten (W), titanium (Ti), or tantalum (Ta). Here, the metallic element of the first gate electrode 220 is the same as that in the metal oxynitride of the barrier layer 230. For example, the first gate electrode 220 can be formed of or includes tungsten (W), and the barrier layer 230 is formed of or includes tungsten oxynitride.

In certain embodiments, the barrier layer 230 is formed of or includes metal nitrides of a metal such as tungsten (W), titanium (Ti), or tantalum (Ta). Here, the metallic element of the first gate electrode 220 is the same as that in the metal nitride of the barrier layer 230. For example, the first gate electrode 220 can be formed of tungsten (W), and the barrier layer 230 is formed of tungsten nitride.

In some embodiments, a work function adjusting layer 225 may be interposed between the first gate electrode 220 and the barrier layer 230. As shown in FIG. 4, the work function adjusting layer 225 may be provided to adjust a work function of the gate lines GL. As an example, the work function adjusting layer 225 may have a work function lower than that of the first gate electrode 220. The work function adjusting layer 225 may have a thickness, which is adjusted in consideration of a work function required for the gate lines GL, or may be doped with a work function adjusting element (e.g., lanthanum (La) or hafnium (Hf)) in consideration of a work function required for the gate lines GL. The work function adjusting layer 225 may be formed of or include at least one of binary metal nitrides (e.g., titanium nitride (TiN) and tantalum nitride (TaN)), ternary metal nitrides (e.g., titanium aluminum nitride (TiAlN), tantalum aluminum nitride (TaAlN), titanium silicon nitride (TiSiN), and tantalum silicon nitride (TaSiN)), or metal oxynitrides obtained by oxidizing them.

According to some embodiments, a gate insulating layer 210 is interposed between the gate lines GL and the active regions ACT and between the gate lines GL and the device isolation layer 110. The gate insulating layer 210 is formed of or includes at least one of an oxide, a nitride, or an oxynitride. However, the material of the gate insulating layer 210 is not limited thereto, and the gate insulating layer 210 may include various other insulating materials. Here, a nitrogen concentration of a second portion 214 of the gate insulating layer 210 adjacent to the second gate electrode 240 is greater than a nitrogen concentration of a first portion 212 of the gate insulating layer 210 adjacent to the first gate electrode 220. For example, the concentration of N+ ions in the second portion 214 is greater than that in the first portion 212. The N+ ions in the second portion 214 can reduce leakage current through the gate insulating layer 210, which can improve the reliability of a semiconductor memory device.

In some embodiments, referring now to FIG. 3, a liner layer 260 is interposed between the second gate electrode 240 and the gate insulating layer 210. As shown in FIG. 5, the liner layer 260 covers an inner side surface of the gate insulating layer 210 and a top surface of the second gate electrode 240. The liner layer 260 extends into a space between the gate insulating layer 210 and the second gate electrode 240. The liner layer 260 is formed of or includes metal nitride. For example, the liner layer 260 can be formed of or includes titanium nitride. Hereinafter, a semiconductor memory device in which the liner layer 260 is not provided will be described.

According to some embodiments, referring back to FIGS. 1, 2A, and 2B, first capping layers 250 may be provided on the gate lines GL. The first capping layers 250 are disposed to fill the remaining spaces of the trenches 120. A top surface of the first capping layers 250 is positioned at the same level as the top surface of the substrate 100. The first capping layers 250 are formed of or include at least one of silicon oxide, silicon nitride, or silicon oxynitride. Both side surfaces of each of the first capping layers 250 are next to the active regions ACT and the device isolation layer 110. The gate insulating layers 210 is interposed between the first capping layers 250 and the active regions ACT and functions as a buffer layer that reduces stress between the active regions ACT and the first capping layers 250. In certain embodiments, the gate insulating layers 210 do not be extended into gaps between the active regions ACT and the first capping layers 250 or between the device isolation layer 110 and the first capping layers 250. For example, the uppermost portions of the gate insulating layers 210 are in contact with side surfaces of the first capping layers 250.

According to some embodiments, a first doped region SD1 and a second doped region SD2 are provided in two of the active regions ACT adjacent to both sides surfaces of the gate lines GL. The first and second doped regions SD1 and SD2 are formed below the top surface of the substrate 100 or in the substrate 100. The first and second doped regions SD1 and SD2 have a conductivity type different from that of the substrate 100. For example, when the substrate 100 is p-type, the first and second doped regions SD1 and SD2 are n-type. The first and second doped regions SD1 and SD2 can be used as a source or drain region.

According to some embodiments, a first pad 310 and a second pad 320 are disposed on the substrate 100, and in some embodiments, the first pad 310 and the second pad 320 are connected to the first doped region SD1 and the second doped region SD2, respectively. The first pad 310 and the second pad 320 are formed of or include at least one conductive material, such as doped poly silicon or a metal.

According to some embodiments, a first interlayer insulating layer 400 is disposed on the first and second pads 310 and 320. The first interlayer insulating layer 400 is formed of or includes at least one of a silicon oxide layer, a silicon nitride layer, or a silicon oxynitride layer.

According to some embodiments, bit lines BL are disposed on the first interlayer insulating layer 400. The bit lines BL are disposed on the first interlayer insulating layer 400 and in a second interlayer insulating layer 540. The second interlayer insulating layer 540 is formed of or includes a silicon oxide layer, a silicon nitride layer, or a silicon oxynitride layer. Each of the bit lines BL is connected to the first pad 310 through a first contact 510, which penetrates the first interlayer insulating layer 400. The bit lines BL and the first contact 510 are formed of or include at least one conductive material, such as doped silicon or a metal.

According to some embodiments, second capping layers 520 are disposed on the bit lines BL, and insulating spacers 530 are provided that cover side surfaces of the bit lines BL. The second capping layers 520 and the insulating spacers 530 are formed of or include at least one of silicon nitride, silicon oxide, or silicon oxynitride.

According to some embodiments, a second contact 610 is disposed on the substrate 100. The second contact 610 penetrates the first and second interlayer insulating layers 400 and 540 and is connected to the second pad 320. The second contact 610 is formed of or includes at least one conductive material, such as doped silicon or a metal.

According to some embodiments, a data storage element connected to the second contact 610 is disposed on the second interlayer insulating layer 540. For example, the data storage element is or includes a capacitor CA that includes a first electrode 620, a second electrode 640, and a dielectric layer 630 interposed between the first electrode 620 and the second electrode 640. The first electrode 620 is shaped like a cylinder with closed bottom. The second electrode 640 covers the first electrode 620. The first electrode 620 and the second electrode 640 are formed of or include at least one of doped silicon, a metal, or a metal compound.

According to some embodiments, a supporting layer 700 is disposed between the second electrode 640 and the second interlayer insulating layer 540. The supporting layer 700 is disposed on an outer sidewall of the first electrode 620, thereby preventing the first electrode 620 from leaning or falling. The supporting layer 700 is formed of or includes an insulating material.

For convenience in illustration, FIG. 2A illustrates an example in which lower portions of the gate lines GL have a rectangular shape, but the inventive concept is not limited thereto. For example, as shown in FIG. 6, a lower region of the trench 120 may have a “U”-shaped section, and thus, the gate line GL filling the trench 120 may have a rounded lower portion. In certain embodiments, the gate lines GL may be provided at different depths, according to their positions. As an example, to reduce a length of a channel region that is formed in the active region ACT between the first and second doped regions SD1 and SD2, the gate lines GL on the active regions ACT may be formed at a relatively high level. For example, the bottom portions of the gate lines GL in the device isolation layer 110 may be lower than those on the active regions ACT.

In a semiconductor memory device according to some embodiments of the inventive concept, each of the gate lines GL includes the first gate electrode 220, which is located at a low level and has a high work-function, and the second gate electrode 240, which is located at a high level and has a low work-function. The second gate electrode 240 can reduce leakage current, such as gate-induced-drain-leakage (GIDL) current, which can occur in the doped regions SD1 or SD2 by the gate lines GL.

In addition, according to some embodiments, the barrier layer 230 can prevent silicon atoms or n-type impurities in the second gate electrode 240 from diffusing into the first gate electrode 220 and can prevent a metal silicide or a metal nitride from forming in the first gate electrode 220. Accordingly, electric characteristics of the gate lines GL can be improved.

Furthermore, according to some embodiments, the N+ ions in the second portion 214 of the gate insulating layer 210 contribute to reducing leakage current into the gate insulating layer 210, which can improve reliability of a semiconductor memory device.

FIGS. 7A and 7B are sectional views that illustrate a semiconductor memory device according to some embodiments of the inventive concept and correspond to a section taken along line I-I′ of FIG. 1.

According to some embodiments, referring to FIGS. 1, 2B, and 7A, a width W2 of the second gate electrode 240 is greater than a width W1 of the first gate electrode 220. When measured in a direction normal to a side surface of the trench 120, a thickness T1 of the first portion 212 of the gate insulating layer 210 is greater than a thickness T2 of the second portion 214 of the gate insulating layer 210. In detail, when compared with an inner sidewall of the first portion 212, an inner sidewall of the second portion 214 is recessed out toward the sidewall of the trench 120. Since the second portion 214 adjacent to the second gate electrode 240 is thinner than the first portion 212 of the gate insulating layer 210, a strong electric field can be generated between the second gate electrode 240 and the doped regions SD1 and SD2. Accordingly, electric characteristics between the second gate electrode 240 and the doped regions SD1 and SD2 can be improved. The thickness T2 of the second portion 214 is about 40% to 70% of the thickness T1 of the first portion 212. For example, the thickness T2 of the second portion 214 is about 50% of the thickness T1 of the first portion 212. If the thickness T2 of the second portion 214 is less than about 40% of the thickness T1 of the first portion 212, leakage current, such as GIDL current, which is produced in the doped regions SD1 and SD2 from the second gate electrode 240 through the gate insulating layer 210 can increase. If thickness T2 of the second portion 214 is more than about 70% of the thickness T1 of the first portion 212, a strong electric field is not generated between the second gate electrode 240 and the doped regions SD1 and SD2.

In addition, according to some embodiments, a nitrogen concentration of the second portion 214 of the gate insulating layer 210 is greater than that of the first portion 212 of the gate insulating layer 210. For example, the second portion 214 can have a high N+ ion concentration. The N+ ions in the second portion 214 reduce leakage current into the gate insulating layer 210, which can improve the reliability of a semiconductor memory device.

According to some embodiments, a width of a lower region of the trench 120 in which the first gate electrode 220 is disposed is less than a width of an upper region of the trench 120 in which the second gate electrode 240 is disposed. The second gate electrode 240 has a width W2 that is greater than a width W1 of the first gate electrode 220.

In some embodiments, the gate insulating layer 210 includes the second portion 214 that is thinner than the first portion 212 and contains the N+ ions. Accordingly, a strong electric field can be generated between the second gate electrode 240 and the doped regions SD1 and SD2, and owing to the N+ ions in the second portion 214, leakage current into the gate insulating layer 210 can be reduced. In other words, according to some embodiments of the inventive concept, the electric characteristics and reliability of a semiconductor memory device can be improved.

FIG. 7A illustrates an example, in which the side surface of the second gate electrode 240 is perpendicular to the top surface of the substrate 100. However, the side surface of the second gate electrode 240 may be at an angle, unlike that shown in FIG. 7A. Referring to FIG. 7B, according to an embodiment, a width of the second gate electrode 240 is greater than the width W2 of the first gate electrode 220 and increases with increasing distance from the substrate 100. In detail, an inner side surface 214 a of the second portion 214 of the gate insulating layer 210 is inclined at an angle relative to an inner side surface of the first portion 212. Here, the thickness T2 of the second portion 214 decreases with increasing distance from the substrate 100. The lowermost portion of the second portion 214 has the thickest portion of the second portion 214, whose thickness is equal to or less than the thickness T1 of the first portion 212. The uppermost portion of the second portion 214 is the thinnest portion of the second portion 214, whose thickness is greater than 30% of the thickness T1 of the first portion 212.

According to an embodiment, the width W2 of the second gate electrode 240 increases with increasing distance from the substrate 100. A width of the lowermost portion of the second gate electrode 240 is equal to or greater than the width W1 of the first gate electrode 220, and a width of the uppermost portion of the second gate electrode 240 is greater than the width W1 of the first gate electrode 220.

According to an embodiment, due to the afore-described shape of the gate insulating layer 210, a width of the capping layer 250 increases with increasing distance from the substrate 100. The width of the lowermost portion of the capping layer 250 is equal to the width of the uppermost portion of the second gate electrode 240, and the width of the uppermost portion of the capping layer 250 is greater than the width of the second gate electrode 240.

FIG. 7C is a sectional view that illustrates a semiconductor memory device according to some embodiments of the inventive concept and corresponds to a section taken along line I-I′ of FIG. 1.

Referring to FIGS. 1, 2, and 7C, according to an embodiment, the gate insulating layer 210 includes a first sub-insulating layer 211. For example, when measured in the direction normal to the side surface of the trench 120, the second portion 214 of the gate insulating layer 210 is thinner than the first portion 212 of the gate insulating layer 210. The first sub-insulating layer 211 is provided on an inner side surface of the second portion 214. The first sub-insulating layer 211 is provided in the trench 120 and covers the inner side surface of the second portion 214. In addition, the first sub-insulating layer 211 encloses the second gate electrode 240 and the capping layer 250. In other words, the first sub-insulating layer 211 is interposed between the second gate electrode 240 and the second portion 214 and between the capping layer 250 and the second portion 214. Here, an inner side surface of the first sub-insulating layer 211 is coplanar with the inner side surface of the first portion 212 of the gate insulating layer 210. The first sub-insulating layer 211 is formed of or includes the same material, such as silicon oxide, as the gate insulating layer 210. Alternatively, the first sub-insulating layer 211 is formed of or includes an oxynitride compound, which contains oxygen, nitrogen, and an element, such as silicon (Si), included in the gate insulating layer 210. For example, the first sub-insulating layer 211 is formed of or includes silicon oxynitride (SiON). In certain embodiments, the first sub-insulating layer 211 further includes an impurity, such as helium (He), hydrogen (H), nitrogen (N), or oxygen (O). A nitrogen concentration of the first sub-insulating layer 211 is higher than a nitrogen concentration of the first portion 212 and a nitrogen concentration of the second portion 214. High-concentration nitrogen ions, i.e., N+, in the first sub-insulating layer 211 can reduce a leakage current passing through the gate insulating layer 210 and the first sub-insulating layer 211, and thus, the reliability of the semiconductor memory device can be improved.

Furthermore, according to an embodiment, the first sub-insulating layer 211 has a better crystal quality than the second portion 214 of the gate insulating layer 210. For example, the number of crystal defects in the first sub-insulating layer 211 is less than the number of crystal defects in the second portion 214. Here, the number of crystal defects refers to the number of crystal defects per unit area. A leakage current from the gate line GL can flow through the crystal defects in the gate insulating layer 210, and thus, fewer crystal defects in the first sub-insulating layer 211 reduces the leakage current from the gate line GL.

FIG. 7D is a sectional view that illustrates a semiconductor memory device according to some embodiments of the inventive concept and corresponds to a section taken along line I-I′ of FIG. 1.

Referring to FIGS. 1, 2, and 7D, according to an embodiment, the width W2 of the second gate electrode 240 is greater than the width W of the first gate electrode 220, and a width W3 of the capping layer 250 is greater than the width W2 of the second gate electrode 240. The gate insulating layer 210 has the first portion 212 adjacent to the first gate electrode 220, the second portion 214 adjacent to the second gate electrode 240, and a third portion 216 adjacent to the capping layer 250. When measured in the direction normal to the side surface of the trench 120, the thickness T1 of the first portion 212 of the gate insulating layer 210 is greater than the thickness T2 of the second portion 214 of the gate insulating layer 210, and the thickness T2 of the second portion 214 is greater than a thickness T3 of the third portion 216. In detail, an inner sidewall of the second portion 214 is recessed from an inner sidewall of the first portion 212 toward the outside of the trench 120, and an inner sidewall of the third portion 216 is recessed from the inner sidewall of the second portion 214 toward the outside of the trench 120. The thickness T2 of the second portion 214 is about 70% to 95% of the thickness T1 of the first portion 212. The thickness T3 of the third portion 216 is about 40% to 70% of the thickness T1 of the first portion 212.

According to an embodiment, a width of an intermediate region of the trench 120, in which the second gate electrode 240 is disposed, is greater than a width of a lower region of the trench 120, in which the first gate electrode 220 is disposed, and is less than a width of an upper region of the trench 120, in which the capping layer 250 is disposed. The width W2 of the second gate electrode 240 is greater than the width W1 of the first gate electrode 220 and is less than the width W3 of the capping layer 250.

According to an embodiment, since the second portion 214 adjacent to the second gate electrode 240 and the third portion 216 adjacent to the capping layer 250 are thinner than the first portion 212 of the gate insulating layer 210, a strong electric field can be generated between the second gate electrode 240 and the doped regions SD1 and SD2. Accordingly, electric characteristics between the second gate electrode 240 and the doped regions SD1 and SD2 can be improved.

FIG. 7E is a sectional view that illustrates a semiconductor memory device according to some embodiments of the inventive concept and corresponds to a section taken along line I-I′ of FIG. 1.

Referring to FIGS. 1, 2, and 7E, according to an embodiment, the gate insulating layer 210 includes the first sub-insulating layer 211 and a second sub-insulating layer 213. For example, when measured in the direction normal to the side surface of the trench 120, the second portion 214 of the gate insulating layer 210 is thinner than the first portion 212 of the gate insulating layer 210, and the third portion 216 of the gate insulating layer 210 is thinner than the second portion 214 of the gate insulating layer 210.

According to an embodiment, the first sub-insulating layer 211 is provided on the inner side surface of the second portion 214. The first sub-insulating layer 211 is provided in the trench 120 and covers the inner side surface of the second portion 214. In addition, the first sub-insulating layer 211 encloses the second gate electrode 240. That is, the first sub-insulating layer 211 is interposed between the second gate electrode 240 and the second portion 214 of the gate insulating layer 210. The inner side surface of the first sub-insulating layer 211 is coplanar with the inner side surface of the first portion 212 of the gate insulating layer 210.

According to an embodiment, the second sub-insulating layer 213 is provided on an inner side surface of the third portion 216. The second sub-insulating layer 213 is provided in the trench 120 and covers the inner side surface of the third portion 216. In addition, the second sub-insulating layer 213 encloses the capping layer 250. That is, the second sub-insulating layer 213 is interposed between the capping layer 250 and the third portion 216 of the gate insulating layer 210. An inner side surface of the second sub-insulating layer 213 is coplanar with the inner side surface of the first portion 212 of the gate insulating layer 210 and the inner side surface of the first sub-insulating layer 211.

According to an embodiment, the first sub-insulating layer 211 and the second sub-insulating layer 213 are formed of or include an oxynitride compound, which contains oxygen, nitrogen, and an element, such as silicon (Si), included in the gate insulating layer 210. For example, the first sub-insulating layer 211 and the second sub-insulating layer 213 are formed of or include silicon oxynitride (SiON). In certain embodiments, the first sub-insulating layer 211 and the second sub-insulating layer 213 further include an impurity, such as helium (He), hydrogen (H), nitrogen (N), or oxygen (O). A nitrogen concentration of the first sub-insulating layer 211 is higher than a nitrogen concentration of the second portion 214, and a nitrogen concentration of the second sub-insulating layer 213 is higher than a nitrogen concentration of the third portion 216. High-concentration nitrogen ions, i.e., N+, in the first and second sub-insulating layers 211 and 213 reduce a leakage current passing through the first and second sub-insulating layers 211 and 213, and thus, the reliability of the semiconductor memory device can be improved.

FIGS. 8A to 14A are sectional views taken along line I-I′ of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive. FIGS. 8B to 14B are sectional views taken along line II-II′ of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive. FIGS. 10C to 12C are enlarged views of portions ‘A’, i.e., a portion of a surface of a first gate electrode, of FIGS. 10A to 12A. FIG. 13C is a sectional view illustrating a process of forming a second gate electrode.

According to some embodiments, referring to FIGS. 1, 8A, and 8B, the device isolation layer 110 is formed in the substrate 100 that define the active regions ACT. The device isolation layer 110 includes at least one of a silicon nitride layer, a silicon oxide layer, or a silicon oxynitride layer. The device isolation layer 110 includes a portion that extends into the substrate 100.

According to some embodiments, the second doped regions SD2 is formed in the active regions ACT of the substrate 100. The second doped regions SD2 is formed by an ion implantation process. The second doped region SD2 is doped with n-type impurities.

According to some embodiments, referring to FIGS. 1, 9A, and 9B, the trenches 120 are formed in an upper portion of the substrate 100. For example, forming the trenches 120 includes forming mask patterns M on the substrate 100 and then etching the substrate 100 and the device isolation layer 110 using the mask patterns M as an etch mask. Each of the trenches 120 is formed to have a line shape extending in the second direction D2. The device isolation layer 110 and the active regions ACT are exposed through the trenches 120. The mask patterns M are removed after the etching process. In FIG. 9A, the trench 120 is illustrated to have a rectangular section, but the inventive concept is not limited thereto. In the case where the substrate 100 is etched to form the trench 120, a center region of a bottom surface of the trench 120 may be more easily etched, compared with an edge region, as shown in FIG. 7. Thus, the trench 120 may be formed to have a bottom surface whose center region is recessed, and a bottom region of the trench 120 may have a “U”-shaped section. Hereinafter, for convenience in description, the inventive concept will be described with reference to the trench 120 of FIG. 9A.

According to some embodiments, referring to FIGS. 1, 10A, and 10B, an insulating layer 215 is formed on the substrate 100 and in the trenches 120. The insulating layer 215 may be formed by, for example, a thermal oxidation process, an atomic layer deposition (ALD) process, or a chemical vapor deposition (CVD) process. The insulating layer 215 is formed to cover the top surface of the substrate 100 and side and bottom surfaces of the trenches 120. The insulating layer 215 is formed of or includes silicon oxide.

Next, according to some embodiments, the gate lines GL are formed in the trenches 120. Each of the gate lines GL includes the first gate electrode 220, the barrier layer 230, and the second gate electrode 240.

According to some embodiments, the first gate electrode 220 is formed in a lower region of each of the trenches 120 that are coated with the insulating layer 215. For example, a conductive material is deposited on the substrate 100. The conductive material is formed to fill the trenches 120. The deposition of the conductive material may be, for example, a CVD process. The conductive material includes a metallic material, such as tungsten (W), titanium (Ti), or tantalum (Ta). Thereafter, the deposited conductive material is etched to form the first gate electrode 220. The etching process is performed until the first gate electrode 220 has a desired thickness.

According to some embodiments, referring to FIG. 10C, the first gate electrode 220 has a polycrystalline structure. The first gate electrode 220 includes a plurality of grains, and in this case, the first gate electrode 220 has an uneven top surface, owing to the presence of the grains. For example, the top surface of the first gate electrode 220 includes a protruding portion P1 and an indented portion P2 that is lower than the protruding portion P1. The indented portion P2 is connected to crystalline defects, such as a grain boundary between the grains, of the first gate electrode 220.

Thereafter, as previously described with reference to FIG. 4, the work function adjusting layer 225 may be formed on the first gate electrode 220. For example, a work function adjusting material may be deposited on the substrate 100. Here, the work function adjusting material may be formed to fill the trench 120. The work function adjusting material may include metal nitrides, such as titanium nitride (TiN) and tantalum nitride (TaN). Next, the deposited work function adjusting material may be etched to form the work function adjusting layer 225. In the case where the work function adjusting layer 225 is formed on the first gate electrode 220, the work function adjusting layer 225 may be formed to have grains, and thus, the work function adjusting layer 225 may have an uneven top surface, whose shape is determined depending on shapes of the grains. In certain embodiments, a process of forming the work function adjusting layer 225 may be omitted. The description that follows will refer to an example of the gate lines GL of FIG. 10A without the work function adjusting layer 225.

According to some embodiments, referring to FIGS. 1, 11A, and 11B, a preliminary barrier layer 235 is formed on the first gate electrode 220. In detail, a surface treatment process is performed on the top surface of the first gate electrode 220. The surface treatment process is an oxidation process. An upper portion of the first gate electrode 220 is oxidized by the surface treatment process to form the preliminary barrier layer 235.

According to some embodiments, referring to FIG. 11C, owing to the uneven top surface of the first gate electrode 220, an oxidation thickness of the upper portion of the first gate electrode 220 is not uniform. For example, the protruding portion P1 is easily oxidized, because it has a relatively large exposed area. By contrast, the indented portion P2 is not easily oxidized, because it has a relatively small exposed area. Accordingly, the preliminary barrier layer 235 on the indented portion P2 is thinner than the preliminary barrier layer 235 on the protruding portion P1.

According to some embodiments, referring to FIGS. 1, 12A, and 12B, the barrier layer 230 is formed on the first gate electrode 220. In detail, a surface treatment process is performed on the preliminary barrier layer 235. The surface treatment process is a nitrification process. As a result of the surface treatment process, the preliminary barrier layer 235 is nitrified to form the barrier layer 230. An upper portion of the first gate electrode 220 is partially nitrified during the surface treatment process. Here, the nitrified upper portion of the first gate electrode 220 constitutes a portion of the barrier layer 230.

According to some embodiments, referring to FIG. 12C, the barrier layer 230 is formed to have a uniform thickness. For example, the nitrification of the preliminary barrier layer 235 is easily performed on both of the protruding and indented portions P1 and P2. As an example, nitrogen atoms easily infiltrate into a grain boundary of the first gate electrode 220. Here, the preliminary barrier layer 235 on the indented portion P2 is more effectively nitrified, because it is thinner than that on the protruding portion P1. Accordingly, during nitrification of the preliminary barrier layer 235 on the protruding portion P1, an upper portion of the first gate electrode 220 is partially nitrified, and in this case, the barrier layer 230 is composed of the nitrified portions of the preliminary barrier layer 235 and the first gate electrode 220. In other words, the barrier layer 230 on the indented portion P2 is thickened, and in this case, the barrier layer 230 has a uniform thickness on the protruding portion P1 and the indented portion P2.

In some embodiments, the surface treatment process is performed on a portion of the insulating layer 215. For example, an exposed fifth portion 219 of the insulating layer 215 that is positioned above the first gate electrode 220 and the barrier layer 230 is nitrified during the surface treatment process. Accordingly, the fifth portion 219 has a N+ ion concentration that is higher than that of a fourth portion 217 adjacent to the first gate electrode 220.

According to some embodiments, referring to FIGS. 1, 13A, and 13B, the second gate electrode 240 is formed on the barrier layer 230. For example, a poly-silicon layer is deposited on the substrate 100 and the insulating layer 215. The poly-silicon layer is formed to fill the trenches 120. The poly-silicon layer may be formed by, for example, a CVD process. Thereafter, the deposited poly-silicon layer is etched and doped with n- or p-type impurities to form the second gate electrode 240. An amount of impurities, which are doped in the poly silicon layer, may be adjusted in consideration of a work function required for the second gate electrode 240. The etching process is performed until the second gate electrode 240 has a desired thickness. In certain embodiments, the deposited poly silicon layer may be doped with n- or p-type impurities, and then, the poly silicon layer may be etched-back to form the second gate electrode 240.

According to some embodiments of the inventive concept, it may be possible to form the barrier layer 230 having a uniform thickness. In the case where the barrier layer 230 has a non-uniform thickness, n- or p-type impurities may be diffused into the first gate electrode 220 through a thin portion of the barrier layer 230. By contrast, in some embodiments, during a process of forming the second gate electrode 240, n- or p-type impurities may not be diffused into the first gate electrode 220. Thus, it may be possible to dope the second gate electrode 240 with a large amount of n- or p-type impurities, for the work function adjustment, without deterioration or damage of the first gate electrode 220. In other words, according to some embodiments of the inventive concept, it may be possible to adjust the work function of the gate lines GL within a relatively large range. This may allow the gate lines GL to have a desired work function that can meet technical requirements for a semiconductor memory device.

In the case where the second gate electrode 240 including poly silicon is doped with a large amount of impurities, the second gate electrode 240 may have a reduced strength. In this case, the top surface 240 a of the second gate electrode 240 may be recessed, as shown in FIG. 13C, or a center region of the top surface 240 a of the second gate electrode 240 may be over-etched during a subsequent etch-back process to be performed after the doping process. As a result, the second gate electrode 240 may be formed to have a top surface whose section is shaped like a letter “V” or “U”. Hereinafter, the inventive concept will be described in more detail with reference to the second gate electrode 240 of FIG. 13A.

As a result of the afore-described process, the gate lines GL are formed in the trenches 120. Each gate line GL includes the first gate electrode 220, the barrier layer 230, and the second gate electrode 240.

According to some embodiments, referring to FIGS. 1, 14A, and 14B, the first capping layers 250 are formed in the trenches 120. For example, forming the first capping layers 250 includes forming a capping layer on the substrate 100 and performing a planarization process on the capping layer. During the formation of the first capping layers 250, at least a portion of the insulating layer 215 is removed from the top surface of the substrate 100. As a result, the gate insulating layer 210 is formed between the gate lines GL and the active regions ACT or between the gate lines G. and the device isolation layer 110. In the case where, as shown in FIG. 13C, the top surface of the second gate electrode 240 of the gate line GL has a “V”- or “U”-shaped section, a bottom portion of the first capping layer 250 may have a shape corresponding to the top surface of the second gate electrode 240. The first capping layers 250 are formed of or include at least one of silicon nitride, silicon oxide, or silicon oxynitride. As a result of the etching process, top surfaces of the device isolation layer 110 and the active regions ACT are exposed.

According to some embodiments, an ion implantation process is performed on the substrate 100 to form the first doped region SD1 in a region of the substrate 100 between two adjacent gate lines GL. The first doped region SD1 has the same conductivity type, such as n-type, as that of the second doped region SD2. The first doped region SD1 is formed to be deeper than the second doped region SD2.

In certain embodiments, the liner layer 260 is formed before forming the second gate electrode 240. The liner layer 260 may be formed by, for example, a CVD process. The liner layer 260 is formed to conformally cover the insulating layer 215. The liner layer 260 is formed of or includes at least one metallic material or metal nitride material. For example, the liner layer 260 includes at least one of titanium (Ti), tungsten (W), or nitrides thereof. If the liner layer 260 is formed, a semiconductor memory device fabricated by a subsequent process has the same structure as that shown in FIG. 5. Hereinafter, embodiments of the inventive concept will be described with reference to an example in which no liner layer 260 is formed.

According to some embodiments, referring back to FIGS. 1, 2A, and 213, a conductive layer is formed on the substrate 100 and is patterned to form the first pad 310 and the second pad 320. The first pad 310 is connected to the first doped region SD1, and the second pad 320 is connected to the second doped region SD2. The first pad 310 and the second pad 320 are formed of or include at least one of a doped poly-crystalline silicon layer, a doped single-crystalline silicon layer, or a metal layer.

According to some embodiments, the first interlayer insulating layer 400 is formed on the first and second pads 310 and 320. The first interlayer insulating layer 400 may be formed by, for example, a CVD process. A portion of the first interlayer insulating layer 400 is patterned to form contact holes. A conductive material is formed on the first interlayer insulating layer 400 to fill the contact holes, and then, a capping layer is formed on the conductive material. The capping layer and the conductive material are patterned to form first contacts 510 in the contact holes, the bit lines BL, and the second capping layers 520 on the bit lines BL. An insulating spacer layer is conformally deposited on the first interlayer insulating layer 400 and is anisotropically etched to form insulating spacers 530 that cover side surfaces of the bit lines BL.

According to some embodiments, the second interlayer insulating layer 540 is formed on the first interlayer insulating layer 400, and then, a planarization process is performed to expose top surfaces of the second capping layers 520. Thereafter, the second contact 610 are formed that penetrate the second interlayer insulating layer 540 and the first interlayer insulating layer 400 to be connected to the second pad 320. The supporting layer 700 is formed on the second interlayer insulating layer 540. The supporting layer 700 may be formed by, for example, a CVD process. The first electrodes 620 are formed that penetrate the supporting layer 700, and each of the first electrodes 620 is connected to the second contact 610. The dielectric layer 630, which conformally covers the first electrodes 620, and the second electrode 640, which covers the first electrodes 620, are formed that constitute the capacitor CA. A semiconductor memory device according to some embodiments of the inventive concept can be fabricated by the afore-described method.

According to some embodiments, if the barrier layer 230 does not have a uniform thickness, silicon or n-type impurities can diffuse into the first gate electrode 220 through a thin portion of the barrier layer 230, and electric resistance between the first and second gate electrodes 220 and 240 increases at a thick portion of the barrier layer 230. By contrast, in a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept, the barrier layer 230 is formed to have a substantially uniform thickness. Thus, dispersion errors in a process of forming the barrier layer 230 can be reduced. Furthermore, not only can barrier characteristics of the barrier layer 230 be improved, but also electric characteristics between the first and second gate electrodes 220 and 240.

FIGS. 15A and 17A are sectional views taken along line I-I′ of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept. FIGS. 15B and 17B are sectional views taken along line II-II′ of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

According to some embodiments, referring to FIGS. 1, 15A, and 15B, the second gate electrode 240 is formed to be wider than the first gate electrode 220. For example, an etching process is performed on the structure of FIGS. 12A and 12B. As a result of the etching process, the insulating layer 215 is partially removed. For example, the etching process is performed on the fifth portion 219 of the insulating layer 215, which is located above the first gate electrode 220 and the barrier layer 230. Accordingly, when measured in a direction perpendicular to the side surface of the trench 120, the fourth portion 217 of the insulating layer 215 is thicker than the fifth portion 219 of the insulating layer 215. An upper width of the trench 120 measured at a level above the first gate electrode 220 is greater than a lower width of the trench 120 at a level of the first gate electrode 220.

According to an embodiment, a portion of the insulating layer 215 removed by the etching process has a worse crystal quality than the remaining portion, such as the fourth and fifth portions 217 and 219, of the insulating layer 215. For example, a portion of the insulating layer 215 may be damaged during the process of forming the first gate electrode 220 described with reference to FIGS. 10A and 10B. In detail, a conductive material is deposited on the insulating layer 215 to fill the trench 120, and then, the conductive material is etched to form the first gate electrode 220. The etching process is performed until the first gate electrode 220 has a desired thickness, and in this case, a portion of the insulating layer 215, which is located above the top surface of the first gate electrode 220, may be damaged by the etching process. Accordingly, many crystal defects may be created in the portion of the insulating layer 215. The crystal defects can lead to an undesired current flow. For example, in the final structure of the semiconductor memory device, the crystal defects can serve as a current path of a leakage current leaked from the gate line GL.

According to some embodiments, the portion of the insulating layer 215 having the bad crystal quality is removed, and thus, a portion of the insulating layer 215 that serves as a current path of a leakage current is removed. Accordingly, the gate insulating layer 210 with reduced crystal defects is formed, and the leakage current from the gate line GL is reduced.

According to some embodiments, referring to FIGS. 1, 16A, and 16B, the second gate electrode 240 is formed on the barrier layer 230. For example, forming the second gate electrode 240 includes depositing a poly-silicon layer on the barrier layer 230 and doping the poly-silicon layer with n-type impurities. The second gate electrode 240 in an upper region of the trench 120 is wider than the first gate electrode 220 in a lower region of the trench 120.

Thereafter, according to some embodiments, a process previously described with reference to FIGS. 14A, 14B, 2A, and 2B is performed on the structure of FIGS. 16A and 16B to form a semiconductor memory device of FIG. 7A.

FIGS. 15A and 15B illustrate an example, in which the side surface of the second gate electrode 240 is formed to be perpendicular to the top surface of the substrate 100. However, embodiments of the inventive concept are not limited to this example, and in other embodiments, the side surface of the second gate electrode 240 is formed at an angle to the top surface of the substrate 100, unlike that shown in FIGS. 15A and 15B.

According to some embodiments, referring to FIGS. 1, 17A, and 17B, the second gate electrode 240 is wider than the first gate electrode 220. For example, an etching process is performed on the structure of FIGS. 12A and 12B. As a result of the etching process, the insulating layer 215 is partially removed. For example, the etching process is performed on the fifth portion 219 of the insulating layer 215, which is located above the first gate electrode 220 and the barrier layer 230. Here, due to process variations or errors in the etching process, an exposed portion of the insulating layer 215, which is located above the first gate electrode 220, may be non-uniformly etched, and thus, there may be a spatial variation in the etching depth. The etching depth refers to a depth in a direction from an inner side surface of the insulating layer 215 that faces the trench 120 toward the outside of the trench 120. For example, the etching depth of the portion of the insulating layer 215 decreases with decreasing distance from the bottom surface of the trench 120. This can result from the etching solution used in the etching process not completely reaching a bottom region of the trench 120 or from other causes. Accordingly, an inner side surface of the fifth portion 219 of the insulating layer 215 is formed to be inclined at an angle to a top surface of the barrier layer 230. A thickness of the fifth portion 219 of the insulating layer 215 decreases with increasing distance from the substrate 100.

Thereafter, according to an embodiment, the process previously described with reference to FIGS. 13A, 13B, 14A, 14B, 2A, and 2B is performed on the structure of FIGS. 17A and 17B to form the semiconductor memory device of FIG. 7B.

FIGS. 18A and 19A are sectional views taken along line I-I of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept. FIGS. 18B and 19B are sectional views taken along line II-II′ of FIG. 1 that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept.

Referring to FIGS. 1, 18A, and 18B, according to an embodiment, the first sub-insulating layer 211 is formed on the insulating layer 215. The first sub-insulating layer 211 is formed on an inner side surface of the fifth portion 219 of the insulating layer 215.

According to an embodiment, the first sub-insulating layer 211 is formed by a deposition process. For example, one of a thermal oxidation process, an atomic layer deposition (ALD) process, or a chemical vapor deposition (CVD) process may be performed on the structure of FIGS. 12A and 12B to form the first sub-insulating layer 211. The first sub-insulating layer 211 covers the top surface of the barrier layer 230 and the inner side surface of the fifth portion 219 of the insulating layer 215, and then, an anisotropic etching process on the first sub-insulating layer 211 is performed to remove a portion of the first sub-insulating layer 211 located on the barrier layer 230. The first sub-insulating layer 211 is formed of or includes an oxynitride compound, which contains oxygen, nitrogen, and an element, such as silicon (Si), included in the insulating layer 215. For example, the first sub-insulating layer 211 is formed of or includes silicon oxynitride (SiON).

In certain embodiments, the first sub-insulating layer 211 is formed by a curing process. For example, in the structure of FIGS. 12A and 12B, the curing process is performed on an exposed portion of the insulating layer 215 located above the barrier layer 230 to form the first sub-insulating layer 211. Here, the exposed portion of the insulating layer 215 on which the curing process is performed has a worse crystal quality than the remaining portion of the insulating layer 215. For example, the exposed portion of the insulating layer 215 may be damaged during the process of forming the first gate electrode 220 described with reference to FIGS. 10A and 10B. In this case, the exposed portion of the insulating layer 215 located above the top surface of the first gate electrode 220 may be damaged by an etching process, which is performed to form the first gate electrode 220. Accordingly, many crystal defects may be created in the damaged portion of the insulating layer 215. The curing process includes injecting a curing element into the exposed portion of the insulating layer 215. Here, the curing element may be an element in a material that constitutes the insulating layer 215. As an example, when the insulating layer 215 includes silicon oxide, the curing element is oxygen (O). The curing element may include one of various elements, such as helium (He), hydrogen (H), nitrogen (N), or oxygen (O), depending on the materials that constitute the insulating layer 215. One of O₃HF, helium, hydrogen, nitrogen, oxygen, ozone, or hydroxide gases may be used as a reaction gas in the curing process. As a result of the curing process, crystal defects in the damaged portion of the insulating layer 215 are cured. For example, the curing element may be injected into the crystal defects of the insulating layer 215 to improve the crystal quality of the insulating layer 215. The portion of the insulating layer 215 on which the curing process is performed constitutes the first sub-insulating layer 211.

Referring to FIGS. 19A and 19B, according to an embodiment, the second gate electrode 240 is formed on the barrier layer 230. For example, a poly-silicon layer is deposited on the substrate 100 and the insulating layer 215. The poly-silicon layer fills the trenches 120. The poly-silicon layer may be formed by, for example, a CVD process. Thereafter, the deposited poly-silicon layer is etched and doped with n- or p-type impurities to form the second gate electrode 240. The etching process is performed until the second gate electrode 240 has a desired thickness.

Thereafter, according to an embodiment, the first capping layers 250 are formed in the trench 120. For example, the formation of the first capping layers 250 includes forming a capping layer on the substrate 100 and performing a planarization process on the capping layer. Here, a portion of the first sub-insulating layer 211 and a portion of the insulating layer 215 that cover the top surface of the substrate 100 are removed together, after forming the first capping layer 250. This process may be the same as or similar to the process described with reference to FIGS. 14A and 148.

Thereafter, according to some embodiments, the process previously described with reference to FIGS. 14A, 14B, 2A, and 2B is performed on the structure of FIGS. 19A and 19B to form the semiconductor memory device of FIG. 7C.

FIGS. 20A and 20B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept. In detail, FIG. 20A corresponds to a sectional view taken line I-I′ of FIG. 1, and FIG. 20B corresponds to a sectional view taken line II-II′ of FIG. 1.

Referring to FIGS. 1, 20A, and 20B, according to an embodiment, the capping layer 250 is formed to be wider than the second gate electrode 240. An etching process is performed on the structure of FIGS. 16A and 16B. As a result of the etching process, the insulating layer 215 is partially removed. For example, the etching process is performed on a sixth portion 218 of the insulating layer 215 located above the second gate electrode 240. Accordingly, when measured in the direction perpendicular to the side surface of the trench 120, the fifth portion 219 of the insulating layer 215 is thicker than the sixth portion 218 of the insulating layer 215. A width of an upper region of the trench 120, which is located above the first gate electrode 220, is greater than a width of a lower region of the trench 120, in which the first gate electrode 220 is disposed, and is greater than a width of an intermediate region of the trench 120, in which the second gate electrode 240 is disposed.

According to an embodiment, a portion of the insulating layer 215 removed by the etching process may have a worse crystal quality than the remaining portion, such as the fourth to sixth portions 217, 219, and 218, of the insulating layer 215. For example, a portion of the insulating layer 215 may be damaged during the process of forming the second gate electrode 240 described with reference to FIGS. 13A and 13B. In detail, a second gate electrode material, such as poly silicon, etc., is deposited on the barrier layer 230 to fill the trench 120, and an etching process is performed on the second gate electrode material to form the second gate electrode 240. The etching process is performed until the second gate electrode 240 has a desired thickness, and in this case, a portion of the insulating layer 215 located above the top surface of the first gate electrode 220 may be damaged by the etching process. Accordingly, many crystal defects may be created in the damaged portion of the insulating layer 215. The crystal defects can lead to an undesired current flow. For example, in the final structure of the semiconductor memory device, the crystal defects can serve as a current path of a leakage current leaked from the gate line GL.

According to some embodiments, the bad crystal quality portion of the insulating layer 215 is removed, and thus, a portion of the insulating layer 215 that serves as a current path of a leakage current is removed. Accordingly, the gate insulating layer 210 with reduced crystal defects can be formed, and a leakage current from the gate line GL can be reduced.

Thereafter, according to some embodiments, the process previously described with reference to FIGS. 14A, 14B, 2A, and 2B is performed on the structure of FIGS. 20A and 201B to form the semiconductor memory device of FIG. 7D.

FIGS. 21A and 21B are sectional views that illustrate a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept. In detail, FIG. 21A corresponds to a sectional view taken line I-I′ of FIG. 1, and FIG. 21B corresponds to a sectional view taken line II-II′ of FIG. 1.

According to an embodiment, the second sub-insulating layer 213 is formed on the insulating layer 215. The second sub-insulating layer 213 is formed on an inner side surface of the sixth portion 218 of the insulating layer 215.

Referring to FIGS. 1, 21A, and 21B, according to an embodiment, the first sub-insulating layer 211 is formed by a deposition process. For example, the process described with reference to FIGS. 20A and 20B is performed on the structure of FIGS. 19A and 19B to form the capping layer 250, which is wider than the second gate electrode 240. For example, an etching process is performed to remove a portion of the insulating layer 215. For example, the etching process is performed on the sixth portion 218 of the insulating layer 215 located above the second gate electrode 240. Accordingly, when measured in the direction perpendicular to the side surface of the trench 120, the fifth portion 219 of the insulating layer 215 is thicker than the sixth portion 218 of the insulating layer 215.

According to an embodiment, one of a thermal oxidation process, an atomic layer deposition (ALD) process, or a chemical vapor deposition (CVD) process may be performed on the insulating layer 215 to form the second sub-insulating layer 213. The second sub-insulating layer 213 is formed to cover the top surface of the second gate electrode 240 and the inner side surface of the sixth portion 218 of the insulating layer 215, and then, an anisotropic etching process on the second sub-insulating layer 213 is performed to remove a portion of the second sub-insulating layer 213 located on the second gate electrode 240. The second sub-insulating layer 213 is formed of or includes an oxynitride compound, which contains oxygen, nitrogen, and an element, such as silicon (Si), included in the insulating layer 215. For example, the second sub-insulating layer 213 is formed of or includes silicon oxynitride (SiON).

In certain embodiments, the second sub-insulating layer 213 is formed by a curing process. For example, in the structure of FIGS. 19A and 19B, the curing process is performed on an exposed portion of the insulating layer 215 located above the second gate electrode 240 to form the second sub-insulating layer 213. Here, the exposed portion of the insulating layer 215 on which the curing process is performed has a worse crystal quality than the remaining portion of the insulating layer 215. For example, the exposed portion of the insulating layer 215 may be damaged during the process of forming the second gate electrode 240 described with reference to FIGS. 13A and 13B. In this case, the exposed portion of the insulating layer 215 located above the top surface of the second gate electrode 240 may be damaged by the etching process performed to form the second gate electrode 240. Accordingly, many crystal defects may be created in the damaged portion of the insulating layer 215. The curing process includes injecting a curing element into the exposed portion of the insulating layer 215. Here, the curing element is an element in a material that constitutes the insulating layer 215. As an example, when the insulating layer 215 includes silicon oxide, the curing element is oxygen (O). The curing element may include one of various elements, such as helium (He), hydrogen (H), nitrogen (N), or oxygen (O), depending on the material that constitutes the insulating layer 215. One of O₃HF, helium, hydrogen, nitrogen, oxygen, ozone, or hydroxide gases may be used as a reaction gas in the curing process. As a result of the curing process, the crystal defects in the damaged portion of the insulating layer 215 can be cured. For example, the curing element is injected in the crystal defect of the insulating layer 215 to improve the crystal quality of the insulating layer 215. The portion of the insulating layer 215 on which the curing process is performed constitutes the second sub-insulating layer 213.

Thereafter, according to some embodiments, the process previously described with reference to FIGS. 14A, 14B, 2A, and 2B is performed on the structure of FIGS. 21A and 21B to form the semiconductor memory device of FIG. 7E.

According to some embodiments of the inventive concept, a semiconductor memory device may be configured such that leakage current in a doped region, such as gate-induced-drain-leakage (GIDL) current, is suppressed.

In addition, according to some embodiments of the inventive concept, a barrier layer is provided to prevent silicon or n-type impurities in a second gate electrode from diffusing into a first gate electrode and thereby to prevent a metal silicide layer or a metal nitride layer from forming. Accordingly, electric characteristics of gate lines can be improved.

Furthermore, according to some embodiments of the inventive concept, leakage current into the gate insulating layer can be reduced, which can improve the reliability of a semiconductor memory device.

In a method of fabricating a semiconductor memory device according to some embodiments of the inventive concept, the barrier layer can be formed to have a substantially uniform thickness. Accordingly, dispersion errors in a process of forming the barrier layer can be reduced, which can improve not only barrier characteristics of the barrier layer but also electric characteristics between the first and second gate electrodes.

While exemplary embodiments of the inventive concepts have been particularly shown and described, it will be understood by one of ordinary skill in the art that variations in form and detail may be made therein without departing from the spirit and scope of the attached claims. 

What is claimed is:
 1. A semiconductor memory device, comprising: a semiconductor substrate that includes a trench; a gate insulating layer that covers a bottom surface and an inner side surface of the trench; a first gate electrode disposed in a lower region of the trench, the first gate electrode comprising a first metal; a second gate electrode disposed in the trench and on the first gate electrode; and a barrier layer disposed between the first gate electrode and the second gate electrode, the barrier layer comprising an oxynitride compound containing the first metal, wherein the gate insulating layer comprises a first portion adjacent to the first gate electrode and a second portion adjacent to the second gate electrode, and a thickness of the first portion is greater than a thickness of the second portion, when measured in a direction normal to a side surface of the trench.
 2. The device of claim 1, wherein the thickness of the first portion is 40% to 70% of the thickness of the second portion.
 3. The device of claim 1, wherein a width of the second gate electrode is greater than a width of the first gate electrode.
 4. The device of claim 1, wherein the second portion adjacent to the second gate electrode has a higher nitrogen concentration than the first portion adjacent to the first gate electrode.
 5. The device of claim 1, wherein the thickness of the second portion of the gate insulating layer decreases with increasing distance from the substrate.
 6. The device of claim 1, further comprising a first sub-insulating layer interposed between the second portion of the gate insulating layer and the second gate electrode.
 7. The device of claim 6, wherein an inner side surface of the first sub-insulating layer facing the trench is coplanar with an inner side surface of the first portion of the gate insulating layer.
 8. The device of claim 1, further comprising a capping layer disposed in the trench and on the second gate electrode, wherein the gate insulating layer further comprises a third portion adjacent to the capping layer, and the thickness of the second portion is greater than a thickness of the third portion, when measured in the direction normal to the side surface of the trench.
 9. The device of claim 8, further comprising a second sub-insulating layer interposed between the third portion of the gate insulating layer and the capping layer.
 10. The device of claim 9, wherein an inner side surface of the second sub-insulating layer that faces the trench is coplanar with an inner side surface of the first portion of the gate insulating layer.
 11. The device of claim 8, wherein a width of the capping layer is greater than a width of the second gate electrode.
 12. The device of claim 1, wherein a work function of the second gate electrode is lower than a work function of the first gate electrode.
 13. The device of claim 1, further comprising a liner layer between the barrier layer and the second gate electrode, wherein the liner layer extends in a region between the gate insulating layer and the second gate electrode.
 14. The device of claim 1, further comprising an impurity injection region disposed in the active regions, wherein the impurity injection region comprises a first impurity injection region between the gate lines and a second impurity injection region between the gate lines and the device isolation layer.
 15. A semiconductor memory device, comprising: a substrate that includes active regions arranged in a first direction and are defined by a device isolation layer; a gate line buried in a trench in an upper portion of the substrate, the gate line crossing the active region in a second direction to divide the active region into first and second doped regions, the second direction crossing the first direction; a gate insulating layer that separates the trench from the gate line; a bit line disposed on the gate line, the bit line extending in a third direction crossing both of the first and second directions; and a capacitor disposed on the substrate and connected to the second doped region, wherein the gate line comprises: a first gate electrode disposed in a lower region of the trench, a top surface of the first gate electrode containing oxygen and nitrogen atoms; a second gate electrode on the first gate electrode; and a capping layer on the second gate electrode, and wherein a width of the second gate electrode is greater than a width of the first gate electrode.
 16. The device of claim 15, wherein the gate insulating layer comprises a first portion adjacent to the first gate electrode and a second portion adjacent to the second gate electrode, and a thickness of the first portion is greater than a thickness of the second portion, when measured in a direction normal to a side surface of the trench.
 17. The device of claim 16, wherein the thickness of the second portion of the gate insulating layer decreases with increasing distance from the substrate.
 18. The device of claim 16, wherein the gate insulating layer further comprises a third portion adjacent to the capping layer, and the thickness of the second portion is greater than a thickness of the third portion, when measured in the direction normal to the side surface of the trench.
 19. The device of claim 15, further comprising a first sub-insulating layer disposed between the second gate electrode and the gate insulating layer, wherein a number of crystal defects of the first sub-insulating layer per unit area is less than a number of crystal defects of the gate insulating layer per unit area.
 20. The device of claim 15, further comprising a second sub-insulating layer disposed between the capping layer and the gate insulating layer, wherein a number of crystal defects of the second sub-insulating layer per unit area is less than a number of crystal defects of the gate insulating layer per unit area. 